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About this product Product Information Developed from a symposium sponsored by the PMSE, Polymers for Microelectronics Division of the Society of Polymer Science, Japan, at the th National Meeting of the American Chemical Society held in Anaheim, California, April , , this volume provides an up-to-date assessment of chemically-amplified resist materials chemistry and process considerations.

It reports novel chemistry for single-layer nm lithographic applications, discusses new approaches to silicon-containing resists and multi-level processes, and explores the design of low-dielectric polymer materials for microelectronics applications. Additional Product Features Dewey Edition. Nalamasu, A. Timko, E. Reichmanis, F. Houlihan, A. Novembre, R. Tarascon, N. Mnzel, and S. Ito, G. Breyta, D. Hofer, and R. Mertesdorf, N, Mnzel, P.

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Reichmanis, Elsa [WorldCat Identities]

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